Focused beams of fast neutral atoms in glow discharge plasma
暂无分享,去创建一个
[1] A. Anders,et al. Plasma potential of a moving ionization zone in DC magnetron sputtering , 2017 .
[2] H. Barankova,et al. Magnetized hollow cathode activated magnetron , 2015 .
[3] V. Kolobov,et al. Glow discharges with electrostatic confinement of fast electrons , 2015 .
[4] M. Volosova,et al. Source of metal atoms and fast gas molecules for coating deposition on complex shaped dielectric products , 2013 .
[5] Y. Melnik,et al. Broad beam sources of fast molecules with segmented cold cathodes and emissive grids , 2012 .
[6] V. Prudnikov,et al. Glow discharge with electrostatic confinement of electrons in a chamber bombarded by fast electrons , 2011 .
[7] Y. Melnik,et al. Filling the vacuum chamber of a technological system with homogeneous plasma using a stationary glow discharge , 2009 .
[8] V. Prudnikov,et al. A compact vapor source of conductive target material sputtered by 3-keV ions at 0.05-Pa pressure , 2009 .
[9] D. J. Economou. Fast (tens to hundreds of eV) neutral beams for materials processing , 2008 .
[10] B. Heinemann,et al. Negative ion RF sources for ITER NBI: status of the development and recent achievements , 2007 .
[11] Raymond L. Boxman,et al. Vacuum arc deposition devices , 2006 .
[12] E. Levashov,et al. Nanostructured thin films and nanodispersion strengthened coatings , 2004 .
[13] C. Ruset,et al. The influence of ion implantation on the properties of titanium nitride layer deposited by magnetron sputtering , 2002 .
[14] J. Musil,et al. Pulsed dc magnetron discharge for high-rate sputtering of thin films , 2001 .
[15] A. V. Phelps,et al. Cross Sections and Swarm Coefficients for Nitrogen Ions and Neutrals in N2 and Argon Ions and Neutrals in Ar for Energies from 0.1 eV to 10 keV , 1991 .
[16] D. Nir. Space charge effects and dynamic interactions in the case of a broad and intense ion beam bombarding an insulated substrate , 1986 .
[17] M. Akiba,et al. Extraction Electrode for a 100-kV, 40-A, 10-s Ion Source , 1985 .