From overall equipment efficiency (OEE) to overall Fab effectiveness (OFE)
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Lothar Pfitzner | Eckhard Müller | Markus Pfeffer | Richard Oechsner | E. Müller | R. Oechsner | M. Pfeffer | L. Pfitzner | Harald Binder | T. Vonderstrass | Harald Binder | Thomas Vonderstrass
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[2] John P. Dismukes. The following paper was the basis for a presentation at the International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM), held at Tempe, Arizona, USA. in 2002. FACTORY LEVEL METRICS: BASIS FOR PRODUCTIVITY IMPROVEMENT , 2002 .
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