Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure
暂无分享,去创建一个
Xavier Borrisé | Francesc Pérez-Murano | Laura Evangelio | Marta Fernández-Regúlez | Matteo Lorenzoni | Jordi Fraxedas | F. Pérez-Murano | M. Lorenzoni | L. Evangelio | M. Fernández-Regúlez | X. Borrisé | J. Fraxedas
[1] Juan J. de Pablo,et al. Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces , 2012 .
[2] Soojin Park,et al. Directed Self‐Assembly of Block Copolymers on Two‐Dimensional Chemical Patterns Fabricated by Electro‐Oxidation Nanolithography , 2010, Advanced materials.
[3] Marc Bazin,et al. Chemical modification of polystyrene by low-energy (<100 eV) electron irradiation studied by mass spectrometry , 2008 .
[4] Yasuhiko Tada,et al. Directed Self-Assembly of Diblock Copolymer Thin Films on Chemically-Patterned Substrates for Defect-Free Nano-Patterning , 2008 .
[5] E. Kramer,et al. Graphoepitaxy of Spherical Domain Block Copolymer Films , 2001 .
[6] Graeme P. A. Malcolm,et al. Physics and Applications of T-Rays , 2014 .
[7] B. Ocko,et al. Block copolymer self-assembly in chemically patterned squares , 2011 .
[8] Venkat Ganesan,et al. Dewetting of PMMA on PS−Brush Substrates , 2009 .
[9] A. Mayes,et al. Block copolymer thin films : Physics and applications , 2001 .
[10] Christophe Navarro,et al. Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements , 2012, Advanced Lithography.
[11] G.E. Moore,et al. Cramming More Components Onto Integrated Circuits , 1998, Proceedings of the IEEE.
[12] Guoliang Liu,et al. Integration of Density Multiplication in the Formation of Device‐Oriented Structures by Directed Assembly of Block Copolymer–Homopolymer Blends , 2010 .
[13] Christophe Navarro,et al. Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study , 2011 .
[14] R. Ruiz,et al. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly , 2008, Science.
[15] Joy Cheng,et al. Self-assembling materials for lithographic patterning: overview, status, and moving forward , 2010, Advanced Lithography.
[16] Juan J. de Pablo,et al. Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments , 2010 .
[17] Seiji Nagahara,et al. Advances in directed self assembly integration and manufacturability at 300 mm , 2013, Advanced Lithography.
[18] Eungnak Han,et al. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats , 2011 .
[19] Justin D. Holmes,et al. Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films , 2009, International journal of molecular sciences.
[20] F. Pérez-Murano,et al. Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers. , 2014, ACS applied materials & interfaces.
[21] Martin,et al. Physical and chemical changes in polystyrene during electron irradiation using EELS in the TEM: contribution of the dielectric function , 1998, Journal of microscopy.
[22] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.