Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy
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G. Eda | G. Fechine | C. Phelan | C. D. Matos | E. Kelleher | R. Woodward | T. Runcorn | C. D. Matos | R. Murray | R. D. Oliveira | S. Li | E. C. D. Oliveira | E C de Oliveira