Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide
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C. Adelmann | M. Caymax | T. Conard | A. Delabie | J. Locquet | S. Gendt | J. Seo | D. Schmeißer | D. Friedrich | S. Elshocht | M. Tallarida | D. Cuypers | L. Rodriguez | A. D. Clercq