Realisation of quantitative Makyoh topography using a digital micromirror device

Makyoh topography (MT) is an optical characterisation tool for flatness testing of mirror-like surfaces. In MT, the surface is illuminated by a collimated light beam, and the reflected image is detected on a screen placed some distance away from the sample. Because of the focussing/defocussing action of the surface undulaations, the image shows intensity variations related to the sample morphology. In its original form, MT is qualitative only. By inserting a structured mask (e.g., a grid) into the path of the illuminating beam, the surface topography can be calculated by the integration of the gradients obtained by the determination of the displacements of the grid node positions, compared to a reference flat, similarly to a wavefront sensor. A DMD provides an easy and verstile way of realisation of such a structured mask. In this paper, we report on a quantitative MT set-up using a programmed DMD. Possibilities of the realisation of different mask patterns are analysed. The results are compared to interferometry.

[1]  K. H. Yang,et al.  An Optical Imaging Method for Wafer Warpage Measurements , 1985 .

[2]  M. Kawashima,et al.  Evaluation of directly bonded silicon wafer interface by the magic mirror method , 1990 .

[3]  I. Lukács,et al.  Sensitivity and measurement errors of Makyoh topography , 2005 .

[4]  K. Masuda,et al.  Characterization of mirror-polished silicon wafers by Makyoh method , 1990 .

[5]  John Perry,et al.  II. The magic mirror of Japan. Part I , 1879, Proceedings of the Royal Society of London.

[6]  Ferenc Riesz Makyoh topography: a simple yet powerful optical method for flatness and defect characterization of mirror-like surfaces , 2004, SPIE Photonics Europe.

[7]  F. Riesz,et al.  A simple algorithm for the reconstruction of surface topography from Makyoh-topography images , 2001 .

[8]  Zsolt John Laczik,et al.  Quantitative Makyoh topography , 1999, Other Conferences.

[9]  P R Blaustein,et al.  Characterisation of mirror-polished Si wafers and advanced Si substrate structures using the magic mirror method , 1992 .

[10]  Dennis Saleh Zs , 2001 .

[11]  Ferenc Riesz Camera length and field of view in Makyoh-topography instruments , 2001 .

[12]  K. Kugimiya,et al.  “Makyoh”: The 2000 year old technology still alive , 1990 .

[13]  Du vsan Korytár,et al.  Experimental and computer simulated Makyoh images of semiconductor wafers , 1993 .

[14]  Zhijian Pei,et al.  Finite element analysis for grinding of wire-sawn silicon wafers: a designed experiment , 2003 .

[15]  Zsolt John Laczik Quantitative Makyoh topography , 2000 .

[16]  Ferenc Riesz Geometrical optical model of the image formation in Makyoh (magic-mirror) topography , 2000 .

[17]  T. Müller,et al.  Techniques for analysing nanotopography on polished silicon wafers , 2001 .

[18]  Z. Laczik,et al.  Thermal processing induced plastic deformation in GaAs wafers , 2001 .

[19]  I. Lukács,et al.  Possibilities of quantitative Makyoh topography , 2000, ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386).

[20]  P. R. Blaustein,et al.  Characterization of mirror-like wafer surfaces using the magic mirror method , 1990 .

[21]  F. Riesz Makyoh topography for the morphological study of compound semiconductor wafers and structures , 2001 .