Scaling of multidielectric nonvolatile SONOS memory structures

Abstract Present-day low-power, portable lap-top computers and consumer products require non-volatile semiconductor memory (NVSM) operating at 5 V with a trend towards reducing this level to 3.3 V. The SONOS technology, an acronym for the polySilicon-blocking Oxide-Nitride-tunnel Oxide-Silicon structure used in capacitors and transistors, shows promise as a technology for present and future low voltage NVSM applications. The nitride layer in the dielectric sandwich permits the storage of charge resulting in adjustable threshold voltages. This paper examines the physics and characterization of scaled SONOS NVSM transistors in relation to reducing the programming voltage. We develop a model for the transient characteristics of the SONOS NVSM transistor with: (1) a simple closed-form solution valid for short programming times; and (2) a numerical solution covering the entire range of programming times. The simple closed-form solution clearly illustrates the dependence of the turn-on time and erase/white slope on the dielectric thicknesses, initial stored charge in the nitride, and programming voltage. In particular, we have examined: (1) decreasing the tunnel oxide thickness; and (2) scaling the blocking oxide thickness. By properly scaling the dielectric films (11 A tunnel oxide, 50 A nitride, 40 A blocking oxide), a ±8 V programmable SONOS device has been obtained with a 50 μs write time and a 100 μs erase time for a 3 V memory window, and a ±5 V programmable device with a 100 ms erase and write time for a 1.5 V memory window.

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