论文信息 - The Possibility of Carbonyl Fluoride as a New CVD Chamber Cleaning Gas

The Possibility of Carbonyl Fluoride as a New CVD Chamber Cleaning Gas

Carbonyl fluoride (COF 2 ) has been investigated as an alternative gas for plasma-enhanced chemical vapor deposition (PECVD) chamber cleaning in order to reduce greenhouse gases emitted from the cleaning process in semiconductor manufacturing. The cleaning performance of COF 2 and the environmental impact of its exhaust gases were evaluated using an experimental plasma tool. The results indicated that the cleaning performance of COF 2 was equivalent to that of conventional C 2 F 6 . Furthermore, it was confirmed that the use of COF 2 would enable the reduction of global warming emissions by over 95% relative to the use of C 2 F 6 , and thus COF 2 is considered to be a promising alternative cleaning gas.

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