The use of multilayer mirrors is an interesting alternative for reflective X-ray monochromatization with respect to reflection from crystal optics. The increased photon flux density due to the multilayers' larger bandwidth is of crucial importance for, e.g, full-field X-ray imaging applications. Drawbacks are the introduced modifications of the reflected beam profile as well as a certain loss of coherence, summarized as wavefront degradation. Our recent work has shown that the modification of the beam profile can vary with, e.g., the material composition of the coating applied. In order to verify our findings, a beamline round-robin has been initiated, comparing the wavefront profiles after reflection by selected multilayers at beamlines 32-ID (Advanced Photon Source) and ID19 (European Synchrotron Radiation Facility) with our initial results acquired at BM05 (ESRF) [1].