Selective doping of silicon by rapid thermal and laser assisted processes
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E. Salza | A. Slaoui | A. Slaoui | S. Noël | E. Salza | J. Muller | S. Noël | U Besi-Vetrella | L. Pirozzi | Jean Claude Muller | L. Pirozzi | U. Besi-Vetrella
[1] L. Ventura,et al. Simultaneous dopant diffusion and surface passivation in a single rapid thermal cycle , 1996 .
[2] F. Foulon,et al. Excimer laser induced doping of phosphorus into silicon , 1990 .
[3] A. Slaoui,et al. Phosphorus and Boron Doping of Silicon Thin Films Using ArF Excimer Laser , 1991 .
[4] A. Slaoui,et al. ArF Excimer Laser Doping into Amorphous Silicon thin films , 1991 .
[5] G. G. Bentini,et al. Surface doping of semiconductors by pulsed-laser irradiation in reactive atmosphere , 1988 .
[6] Luisa Pirozzi,et al. Innovative applications of laser technology in photovoltaics , 1997, Photonics West.