Double high refractive-index contrast grating VCSEL

Distributed Bragg reflectors (DBRs) are typically used as the highly reflecting mirrors of vertical-cavity surface-emitting lasers (VCSELs). In order to provide optical field confinement, oxide apertures are often incorporated in the process of the selective wet oxidation of high aluminum-content DBR layers. This technology has some potential drawbacks such as difficulty in controlling the uniformity of the oxide aperture diameters across a large-diameter (≥ 6 inch) production wafers, high DBR series resistance especially for small diameters below about 5 μm despite elaborate grading and doping schemes, free carrier absorption at longer emission wavelengths in the p-doped DBRs, reduced reliability for oxide apertures placed close to the quantum wells, and low thermal conductivity for transporting heat away from the active region. A prospective alternative mirror is a high refractive index contrast grating (HCG) monolithically integrated with the VCSEL cavity. Two HCG mirrors potentially offer a very compact and simplified VCSEL design although the problems of resistance, heat dissipation, and reliability are not completely solved. We present an analysis of a double HCG 980 nm GaAs-based ultra-thin VCSEL. We analyze the optical confinement of such a structure with a total optical thickness is ~1.0λ including the optical cavity and the two opposing and parallel HCG mirrors.