Effect of sputtering target power density on topography and residual stress during growth of nanocomposite nc-TiN/a-SiNx thin films

[1]  H. Du,et al.  Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films , 2004 .

[2]  H. Du,et al.  Bias-graded deposition of diamond-like carbon for tribological applications , 2003 .

[3]  Zhifeng Zhou,et al.  XPS, AFM and nanoindentation studies of Ti1−xAlxN films synthesized by reactive unbalanced magnetron sputtering , 2003 .

[4]  Y. Fu,et al.  Magnetron sputtered hard a-C coatings of very high toughness , 2003 .

[5]  Yong Qing Fu,et al.  Recent advances of superhard nanocomposite coatings: a review , 2003 .

[6]  Chang Q. Sun,et al.  Interfacial structure, residual stress and adhesion of diamond coatings deposited on titanium , 2003 .

[7]  K. Kim,et al.  Deposition and mechanical properties of Ti–Si–N coated layer on WC–Co by RF inductively coupled plasma-enhanced chemical vapor deposition , 2002 .

[8]  Y. Mai,et al.  Atomic force microscopy study of surface roughening of sputter-deposited TiN thin films , 2002 .

[9]  J. Zuo,et al.  Surface evolution of ultrahigh vacuum magnetron sputter deposited amorphous SiO2 thin films , 2002 .

[10]  A. Cavaleiro,et al.  How is the chemical bonding of W-Si-N sputtered coatings? , 2001 .

[11]  Malcolm L. H. Green,et al.  Applications of nanocomposites , 2001 .

[12]  R. A. McGill,et al.  Laser-based processing of polymer nanocomposites for chemical sensing applications , 2001 .

[13]  T. Bolom,et al.  Composition, nanostructure and origin of the ultrahardness in nc-TiN/a-Si3N4/a- and nc-TiSi2 nanocomposites with HV= 80 to ≥ 105 GPa , 2000 .

[14]  Peter Hing,et al.  Residual stress characterization of diamond-like carbon coatings by an X-ray diffraction method , 1999 .

[15]  S. Vepřek.  The search for novel, superhard materials , 1999 .

[16]  W. Ensinger.  Low energy ion assist during deposition — an effective tool for controlling thin film microstructure , 1997 .

[17]  Jeffries,et al.  Instability of Kinetic Roughening in Sputter-Deposition Growth of Pt on Glass. , 1996, Physical review letters.

[18]  Yang,et al.  Noise-induced roughening evolution of amorphous Si films grown by thermal evaporation. , 1996, Physical review letters.

[19]  T. Cselle,et al.  Today's applications and future developments of coatings for drills and rotating cutting tools , 1995 .

[20]  S. Vepřek,et al.  A concept for the design of novel superhard coatings , 1995 .

[21]  H. Oettel,et al.  Residual stresses in PVD hard coatings , 1995 .

[22]  Tong,et al.  Atomic force microscope study of growth kinetics: Scaling in the heteroepitaxy of CuCl on CaF2(111). , 1994, Physical review letters.

[23]  Hongrui Peng,et al.  Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition , 1992 .

[24]  M. V. Staden,et al.  Selective steam oxidation of titanium and aluminium in TiN and (Ti, Al)N physically vapour-deposited coatings on dental surgical tools , 1991 .

[25]  H. Windischmann,et al.  Intrinsic stress in sputtered thin films , 1991 .

[26]  K. Helming,et al.  Implantation-induced texture , 1989 .

[27]  R. M. Bradley,et al.  Theory of thin‐film orientation by ion bombardment during deposition , 1986 .

[28]  H. Holleck.  Material selection for hard coatings , 1986 .

[29]  L. Porte,et al.  Vacancy effects in the x-ray photoelectron spectra of Ti N x , 1983 .

[30]  A. Gusev.  Effects of the nanocrystalline state in solids , 1998 .

[31]  G. Vojta,et al.  Fractal Concepts in Surface Growth , 1996 .

[32]  B. El-Kareh.  Thin Film Deposition , 1995 .

[33]  W. Stickle,et al.  Handbook of X-Ray Photoelectron Spectroscopy , 1992 .

[34]  G. A. Slack,et al.  Thermal expansion of some diamondlike crystals , 1975 .

[35]  I. Barin,et al.  Thermochemical properties of inorganic substances , 1973 .