Anisotropic-etching process simulation system MICROCAD analyzing complete 3D etching profiles of single crystal silicon
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Kazuo Asaumi | Kazuo Sato | K. Asaumi | Y. Iriye | Y. Iriye | K. Sato
[1] Carlo H. Séquin. Computer simulation of anisotropic crystal etching , 1991 .
[2] A. Koide,et al. Simulation of three-dimensional etch profile of silicon during orientation dependent anisotropic etching , 1991, Proceedings IEEE The Tenth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots.
[3] Willy Sansen,et al. Compensation structures for convex corner micromachining in silicon , 1990 .
[4] F. C. Frank,et al. Orientation‐Dependent Dissolution of Germanium , 1960 .
[5] G. Delapierre. Micro-machining: A survey of the most commonly used processes , 1989 .
[6] N. D. de Rooij,et al. CAD for silicon anisotropic etching , 1990, IEEE Proceedings on Micro Electro Mechanical Systems, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots..
[7] D. Shaw,et al. Morphology analysis in localized crystal growth and dissolution , 1979 .
[8] R. J. Jaccodine,et al. Use of Modified Free Energy Theorems to Predict Equilibrium Growing and Etching Shapes , 1962 .
[9] D. B. Lee. Anisotropic Etching of Silicon , 1969 .