II-2 – Cylindrical Magnetron Sputtering

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[28]  David P. Smith SCATTERING OF LOW-ENERGY NOBLE GAS IONS FROM METAL SURFACES. , 1967 .

[29]  H. F. Winters The growth of nitrided surface layers by ion bombardment , 1972 .

[30]  R. L. Jepsen Magnetically Confined Cold‐Cathode Gas Discharges at Low Pressures , 1961 .

[31]  G. Carter Ion Reflection, Penetration, and Entrapment in Solids , 1970 .

[32]  N. Ivanov,et al.  dc magnetron system for cathode sputtering , 1976 .

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[43]  J. Thornton Magnetron sputtering: basic physics and application to cylindrical magnetrons , 1978 .

[44]  John A. Thornton,et al.  Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings , 1974 .

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[47]  F. M. Penning Die glimmentladung bei niedrigem druck zwischen koaxialen zylindern in einem axialen magnetfeld , 1936 .

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[57]  F. C. Hoh Instability of Penning‐Type Discharges , 1963 .

[58]  D. Kerr Helical Instability in a Penning Discharge , 1966 .

[59]  T. Yamashina,et al.  Sorption Rate at Low Pressures of Oxygen by Titanium , 1971 .

[60]  W. Knauer Mechanism of the Penning Discharge at Low Pressures , 1962 .

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[63]  D. Oblas,et al.  ARGON CONCENTRATION IN TUNGSTEN FILMS DEPOSITED BY dc SPUTTERING. , 1970 .

[64]  P. Stuart Some measurements of stress in thin films prepared by low pressure triode sputtering , 1969 .

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[66]  K. Wasa,et al.  Sputtering in a Crossed Electromagnetic Field , 1967 .

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[68]  T. Allen,et al.  The appearance of some oscillating discharges , 1955 .

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[70]  E. Kay,et al.  Ion implantation during film growth and its effect on the superconducting properties of niobium , 1975 .

[71]  H. F. Winters Sputtering of Chemisorbed Nitrogen with Ar , 1971 .

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[74]  J. Thornton,et al.  Tubular hollow cathode sputtering onto substrates of complex shape , 1975 .