Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
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Jian Wang | Stephen Y. Chou | S. Chou | L. Zhuang | J. Wang | Lei Zhuang | Mingtao Li | Mingtao Li
[1] Stephen Y. Chou,et al. Imprint lithography with sub-10 nm feature size and high throughput , 1997 .
[2] Stephen Y. Chou,et al. Imprint of sub-25 nm vias and trenches in polymers , 1995 .
[3] Erik H. Anderson,et al. Circularly symmetric operation of a concentric‐circle‐grating, surface‐ emitting, AlGaAs/GaAs quantum‐well semiconductor laser , 1992 .
[4] James F. Stevenson,et al. Innovation in polymer processing : molding , 1996 .
[5] Nasser N Peyghambarian,et al. Design and fabrication of circular grating coupled distributed Bragg reflector lasers , 1998 .
[6] T. Tamamura,et al. Application of x-ray mask fabrication technologies to high resolution, large diameter Ta Fresnel zone plates , 1997 .
[7] Y. Vladimirsky,et al. Moiré method and zone plate pattern inaccuracies , 1988 .
[8] Ian McNulty,et al. High‐resolution Fresnel zone plates for soft x rays , 1988 .
[9] Gerd Schneider,et al. Cross‐linked polymers for nanofabrication of high‐resolution zone plates in nickel and germanium , 1995 .
[10] R. Maciejko,et al. Electrically pumped circular-grating distributed-Bragg-reflector lasers , 1992, IEEE Photonics Technology Letters.
[11] Mial E. Warren,et al. Subwavelength, binary lenses at infrared wavelengths , 1997 .