Model-based design improvements for the 100-nm lithography generation
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Matthew A. Thompson | Sergei V. Postnikov | Karl Wimmer | Kyle Patterson | Carla Nelson-Thomas | Lloyd C. Litt | Patrick K. Montgomery | Chi-Min Yuan | Russell L. Carter | Kevin Lucas
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[2] Geert Vandenberghe,et al. Model-based OPC for first-generation 193-nm lithography , 2001, SPIE Advanced Lithography.
[3] D. Reber,et al. A high density 0.10 /spl mu/m CMOS technology using low K dielectric and copper interconnect , 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).