Next generation low temperature polycrystalline materials for above IC electronics. High mobility n- and p-type III–V metalorganic vapour phase epitaxy thin films on amorphous substrates
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P. Hurley | Michael Schmidt | A. Gocalinska | E. Pelucchi | K. Thomas | I. Povey | A. Pescaglini | F. Gity | R. Nagle | P. Michałowski | E. Mura | Eleonora Secco | A. Curran
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