Radiation-hard, charge-coupled devices for the extreme ultraviolet variability experiment

The Extreme-Ultraviolet Variability Experiment (EVE) is a component of NASA's Solar Dynamics Observatory (SDO) satellite, aimed at measuring the solar extreme ultraviolet (EUV) irradiance with high spectral resolution, temporal cadence, accuracy, and precision. The required high EUV quantum efficiency (QE), coupled with the radiation dose to be experienced by the detectors during the five year mission (~1 Mrad), posed a serious challenge to the charge-coupled device (CCD) detectors. MIT Lincoln Laboratory developed the 2048 × 1024 pixel CCDs and integrated them into the detector system. The devices were back-side thinned and then back surface passivated using a thin, heavily boron-doped silicon layer grown by molecular beam epitaxy (MBE) at less than 450°C. Radiation-hardness testing was performed using the Brookhaven National Laboratory's National Synchrotron Light Source (BNL/NSLS). The MBE-passivated devices were compared against devices with back surfaces passivated with a silver charge chemisorption process and an ion-implant/furnace anneal process. The MBE devices provided both the highest QE at the required (-100°C) operating temperatures, and superior radiation hardness, exceeding the goals for the project. Several flight-ready devices were delivered with the detector system for integration with the satellite.

[1]  Ping-Shine Shaw,et al.  Stability of photodiodes under irradiation with a 157-nm pulsed excimer laser. , 2005, Applied optics.

[2]  M. Lesser,et al.  CCD soft-x-ray detectors with improved high- and low-energy performance , 2003, 2003 IEEE Nuclear Science Symposium. Conference Record (IEEE Cat. No.03CH37515).

[3]  David A. Crotser,et al.  The EUV Variability Experiment (EVE) aboard the NASA Solar Dynamics Observatory (SDO) , 2004, SPIE Asia-Pacific Remote Sensing.

[4]  B. Burke,et al.  Substrate preparation and low-temperature boron doped silicon growth on wafer-scale charge-coupled devices by molecular beam epitaxy , 2002 .

[5]  Gregory Y. Prigozhin,et al.  Progress in x-ray CCD sensor performance for the Astro-E2 x-ray imaging spectrometer , 2004, SPIE Astronomical Telescopes + Instrumentation.

[6]  Wes Lukaszek HOW TO AVOID CHARGING DAMAGE IN IC MANUFACTURING , 2004 .

[7]  Michael E. Hoenk,et al.  Growth of a delta‐doped silicon layer by molecular beam epitaxy on a charge‐coupled device for reflection‐limited ultraviolet quantum efficiency , 1992 .

[8]  Michael P Lesser,et al.  CCD backside coatings optimized for 200- to 300-nm observations , 2000, SPIE Optics + Photonics.

[9]  Michael P Lesser,et al.  Enhancing back-illuminated performance of astronomical CCDs , 1998, Astronomical Telescopes and Instrumentation.

[10]  J. L. Shohet,et al.  Comparison of the vacuum-ultraviolet radiation response of HfO2∕SiO2∕Si dielectric stacks with SiO2∕Si , 2007 .