Fabrication of Achromatic Infrared Wave Plate by Direct Imprinting Process on Chalcogenide Glass

An achromatic infrared wave plate was fabricated by forming a subwavelength grating on the chalcogenide glass using direct imprint lithography. A low toxic chalcogenide glass (Sb?Ge?Sn?S system) substrate was imprinted with a grating of 1.63-?m depth, a fill factor of 0.7, and 3-?m period using glassy carbon as a mold at 253 ?C and 3.8 MPa. Phase retardation of the element reached around 30? at 8.5?10.5 ?m wavelengths, and the transmittance exceeded that of a flat substrate over 8 ?m wavelength. Fabrication of the mid-infrared wave plate is thereby less expensive than that of conventional crystalline wave plates.