论文信息 - Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems

Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems

We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiN/Al(0.5% Cu)/TiN/SiO/sub 2/ etch process.

Costas J. Spanos | Sundeep Rangan | Kameshwar Poolla

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