Mist chemical vapor deposition study of 20 and 100 nm thick undoped ferroelectric hafnium oxide films on n+-Si(100) substrates
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M. Noda | Liu Li | M. Yoshimoto | Daisuke Tahara | Hiroyuki Nishinaka | Shota Sato | T. Kawaharamura
暂无分享,去创建一个
M. Noda | Liu Li | M. Yoshimoto | Daisuke Tahara | Hiroyuki Nishinaka | Shota Sato | T. Kawaharamura