Nucleation and diffusion during growth of ternary Co1−xNixSi2 thin films studied by complementary techniques in real time
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C. Detavernier | C. Lavoie | D. Deduytsche | A. Vantomme | D. Smeets | K. D. Keyser | J. Demeulemeester | C. Comrie | C. Theron