Mask readiness for EUVL pilot line
暂无分享,去创建一个
EUVL pilot line will be launched in 2012 with several pre-production tools installed in world wide. Since there will be still the productivity issue on the exposure tool, certain demand of EUV masks may be required in 2012. In this presentation, the status of EUV mask readiness, such as pattern quality, related infrastructures, and mask handling flow etc., will be discussed.
[1] Jun Yashima,et al. Correction technique of EBM-6000 prepared for EUV mask writing , 2007, SPIE Photomask Technology.
[2] Yasushi Nishiyama,et al. Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics , 2007 .
[3] Kenichi Takahara,et al. A novel defect detection optical system using 199-nm light source for EUVL mask , 2010, Advanced Lithography.
[4] Naoya Hayashi,et al. EUV-mask pattern inspection using current DUV reticle inspection tool , 2007, Photomask Japan.