论文信息 - Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics - 字舞流文

Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics

C. Koay | S. Halle | M. Colburn | S. Hotta | S. Chen | T. Kato | A. Yamaguchi