Exact reconstruction method for on-machine measurement of profile

Abstract We present a new reconstruction method for measuring profile of large, ultraprecise absolute optical surfaces with a compact interferometer. The profile of workpiece can be reconstructed exactly with high lateral resolution and large non-equidistant scanning step. Both systematic errors of the interferometer and height offsets of the scanning stage can be eliminated. Additional angular measurement can be used to measure pitching angles of the scanning stage. The exact reconstruction method is verified by computer simulation and on-machine measurement experiment.

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