Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-1,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists. © 2005 Wiley Periodicals, Inc. J Appl Polym Sci 96: 1505–1514, 2005

[1]  Hyunjung Kim,et al.  Removal of the photoresist (PR) and metallic-polymer in the concave-typed storage node using the excimer laser , 2004 .

[2]  Christopher L. McAdams,et al.  Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists , 2004 .

[3]  Jui‐Hsiang Liu,et al.  Holographic Gratings in Photosensitive Acrylic Polymers with High Refractive Index Diphenyl Sulfide , 2004 .

[4]  Jui‐Hsiang Liu,et al.  Optical switching behavior of polymer-dispersed liquid crystal composite films with various novel azobenzene derivatives , 2004 .

[5]  Jui‐Hsiang Liu,et al.  Synthesis and characterization of novel copolymers with acid‐labile ketal moieties derived from camphor , 2003 .

[6]  Hui Chen,et al.  Preparing an acrylic ester copolymer as an ultrathick negative photo resist , 2003 .

[7]  Robert A. Shick,et al.  Addition Polymerization of Norbornene-Type Monomers Using Neutral Nickel Complexes Containing Fluorinated Aryl Ligands , 2003 .

[8]  T. J. Kemp,et al.  Photoactive liquid polysulfides: preparation, characterisation, photocuring and potential applications , 2003 .

[9]  Jui‐Hsiang Liu,et al.  Fabrication and Characterization of Gradient Refractive Index Plastic Rods Containing Inorganic Nanoparticles , 2003 .

[10]  Wei-Keng Lin,et al.  A novel fabrication method of embedded micro-channels by using SU-8 thick-film photoresists , 2003 .

[11]  P. Garland,et al.  Novel photoacid generators for photodirected oligonucleotide synthesis. , 2003, Journal of the American Chemical Society.

[12]  Paul M. Dentinger,et al.  High aspect ratio patterning with a proximity ultraviolet source , 2002 .

[13]  Jin-beak Kim,et al.  Synthesis and characterization of norbornene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists , 2002 .

[14]  Jong Soon Lee,et al.  Synthesis of acrylic rosin derivatives and application as negative photoresist , 2002 .

[15]  Adam R. Pawloski,et al.  A Standard Addition Technique To Quantify Photoacid Generation in Chemically Amplified Photoresist , 2001 .

[16]  James F. Cameron,et al.  Mechanism of Reaction and Photoacid Generation of N-Oxysuccinimidoarylsulfonate PAGs: A Laser Flash Photolytic Study , 2001 .

[17]  J. Cameron,et al.  Mechanism of Reaction and Photoacid Generation of 1,2-di(Arylsulfonyl)hydrazine PAGs: A Laser Flash Photolytic Study , 2001 .

[18]  N. Iwasawa,et al.  Study on thermal crosslinking reaction of o-naphthoquinone diazides and application to electrodeposition positive photoresist , 2001 .

[19]  Chenming Hu,et al.  Patterning sub-30-nm MOSFET gate with i-line lithography , 2001 .

[20]  K. Ahn,et al.  Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography , 2001 .

[21]  Ki-Ho Baik,et al.  Amine gradient process for DUV lithography , 2001 .

[22]  Eric L. Alemy,et al.  Materials and Resists for 193 and 157nm Applications , 2001 .

[23]  Zheng Cui,et al.  Coding gray-tone mask for refractive microlens fabrication , 2000 .

[24]  T. Corrales,et al.  Photochemistry and photoinitiator properties of novel 1-chloro-substituted thioxanthones. III: Preliminary study of the photoacid generation , 1997 .

[25]  Dan V. Nicolau,et al.  Control of the neuronal cell attachment by functionality manipulation of diazo-naphthoquinone/novolak photoresist surface , 1996 .

[26]  J. Krusius,et al.  Experimental verification of the impact of MOSFET series resistance on device miniaturization down to source-drain area as small as 0.2 mm by 0.3 mm , 1990 .

[27]  A.T. Wu,et al.  Deep-submicrometer MOS device fabrication using a photoresist-ashing technique , 1988, IEEE Electron Device Letters.