Dispersion study of DC and Low Frequency Noise in SiGe: C Heterojunction Bipolar Transistors used for mm-Wave to Terahertz applications

Abstract This work presents an investigation of DC and Low Frequency Noise dispersion in 0.13 μm SiGe:C BiCMOS Heterojunction Bipolar Transistors (HBTs) used for mm-Wave to Terahertz applications. Therefore, DC and Low Frequency Noise measurements have been performed over a half wafer on a large number of transistors. A statistical 1/f noise compact model is presented as well as a study of the repartition of generation-recombination components. The main Low Frequency Noise sources are found to be homogenously distributed in the intrinsic base-emitter junction. The mean 1/f noise level, evaluated by the figure of merit KBmean, is equal to 6 10−10 μm2.