Influence of a Scanning Radial Magnetic Field on Macroparticle Reduction of Arc Ion-Plated Films

Cathode spot motion influences the physical characteristics of arc plasma and the related macroparticles (MPs) in resultant films; these MPs limit the application of arc ion plating (AIP). In this paper, a scanning radial magnetic field (SRMF) was applied to the cathode surface to control the cathode spot motion and reduce the MP contamination in the deposited films. It was shown that film surface morphologies prepared using SRMF were better than those using a static radial magnetic field (RMF). The improvement was greater with increased scanning range and frequency. Using SRMF, cathode spot motion was confined to a spiral trajectory on the cathode surface and the spots moved over a large area and at a fast-moving velocity. Both the large moving area and the fast velocity decreased the temperature on the cathode surface and thus reduced the emission of the MPs.

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