Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison
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K. V. Kozlov | R. Hippler | H. Wagner | L. Zajíčková | J. Behnke | A. Sonnenfeld | T. M. Tun | R. Hippler | A. Sonnenfeld | H.-E. Wagner