论文信息 - Preparation and Properties of ZrF4-Based Fluoride Glass Films by Plasma-Enhanced Chemical Vapor Deposition

Preparation and Properties of ZrF4-Based Fluoride Glass Films by Plasma-Enhanced Chemical Vapor Deposition

ZrF4-based binary glass films are for the first time synthesized by plasma-enhanced chemical vapor deposition (PCVD) and their optical transmission spectrum is measured from the UV to near IR region. The films are pore-free and transparent. No absorption band caused by OH or other impurities can be observed in the near IR region. Weak absorption bands attributed to defect centers, which are induced by plasma bombardment, are observed in the UV to visible region.

Y. Nishida | K. Fujiura | Kenji Kobayashi Kenji Kobayashi | Shiro Takahashi Shiro Takahashi

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