Dopant induced ablation of poly(methyl methacrylate) at 308 nm
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T. Lippert | S. C. Langford | R. L. Webb | J. T. Dickinson | T. Lippert | R. Webb | J. Dickinson | S. Langford
[1] P. Chavel,et al. Microlenses fabricated by ultraviolet excimer laser irradiation of poly(methyl methacrylate) followed by styrene diffusion. , 1996, Applied optics.
[2] S. Namba,et al. Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser , 1982 .
[3] J. Dickinson,et al. Laser-induced emission of neutral atoms and molecules from electron-irradiated NaNO 3 , 1996 .
[4] R. Jackman,et al. Photochemical processing of electronic materials , 1991 .
[5] Hiroshi Masuhara,et al. Each dopant can absorb more than ten photons: Transient absorbance measurement at excitation laser wavelength in polymer ablation , 1994 .
[6] M. Stuke,et al. UV-excimer-laser ablation of polymethylmethacrylate at 248 nm: Characterization of incubation sites with Fourier transform IR- and UV-Spectroscopy , 1989 .
[7] A. Wokaun,et al. Laser Ablation of Doped Polymer Systems , 1997 .
[8] Roger Kelly,et al. On the effect of Knudsen-layer formation on studies of vaporization, sputtering, and desorption , 1988 .
[9] R. Srinivasan,et al. Ultraviolet laser ablation and decomposition of organic materials , 1990 .
[10] S. Nishio,et al. Multiphoton Ionization-Mass Spectrometric Study on Laser Ablation of Polymethylmethacrylate and Polystyrene at 308 nm , 1995 .
[11] C. Fotakis,et al. Spectroscopic studies of ArF laser photoablation of PMMA , 1985 .
[12] M. Luh,et al. Thermal degradation of polymethylmethacrylate. Energies of activation , 1968 .
[13] M. Gower,et al. Time resolved transmission studies of poly(methyl methacrylate) films during ultraviolet laser ablative photodecomposition , 1987 .
[14] D. Dlott,et al. Coherent Raman measurements of polymer thin‐film pressure and temperature during picosecond laser ablation , 1995 .
[15] Nicholas S. Nogar,et al. Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate , 1986 .
[16] H. Hiraoka,et al. Dopant-induced ablation of poly(methyl methacrylate) by a 308-nm excimer laser , 1987 .
[17] M. G. Norton,et al. Neutral and ion emissions accompanying pulsed excimer laser irradiation of polytetrafluoroethylene , 1993 .
[18] N. Allen,et al. Photochemistry of man-made polymers , 1979 .
[19] Bodil Braren,et al. Use of temporally coincident ultraviolet laser pulses of two different wavelengths to ablate organic polymers , 1990 .
[20] B. Dellinger,et al. High-temperature thermal—photolytic oxidation of monochlorobenzene , 1993 .
[21] Juan C. Scaiano,et al. Laser ablation of doped polymers: transient phenomena as the ablation threshold is approached , 1992 .
[22] Jörg Krüger,et al. Femtosecond-pulse visible laser processing of transparent materials , 1996 .
[23] J. Dickinson,et al. Effect of tribological wear on ultraviolet laser interactions with single crystal NaNO3 and CaCO3 , 1996 .
[24] Peter E. Dyer,et al. Refractive-index modification of polymethylmethacrylate (PMMA) thin films by KrF-laser irradiation , 1993 .
[25] D. Krajnovich,et al. Incubation and Photoablation of Poly(methyl methacrylate) at 248 nm. New Insight into the Reaction Mechanism Using Photofragment Translational Spectroscopy , 1997 .
[26] H. Masuhara,et al. Mass spectrometric studies on laser ablation of polystyrene sensitized with anthracene , 1993 .
[27] Graciela B. Blanchet,et al. Laser induced unzipping: A thermal route to polymer ablation , 1994 .
[28] N. S. Nogar,et al. Summary Abstract: Mass spectral identification of ultraviolet‐laser photoablation products from polymers , 1987 .
[29] J. Moacanin,et al. Characterization of a dissociative excited state in the solid state: Photochemistry of poly/methyl methacrylate/ - Photochemical processes in polymeric systems. V , 1980 .
[30] N. Bloembergen. Role of cracks, pores, and absorbing inclusions on laser induced damage threshold at surfaces of transparent dielectrics. , 1973, Applied optics.
[31] S. Babu,et al. Heat transfer and material removal in pulsed excimer‐laser‐induced ablation: Pulsewidth dependence , 1994 .
[32] Bodil Braren,et al. Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nm , 1986 .
[33] R. B. Fox,et al. Infrared laser ablation of polymers , 1978 .
[34] Bodil Braren,et al. Nature of ‘‘incubation pulses’’ in the ultraviolet laser ablation of polymethyl methacrylate , 1990 .
[35] S. Nishio,et al. Laser ablation of polymethylmethacrylate and polystyrene at 308 nm: Demonstration of thermal and photothermal mechanisms by a time‐of‐flight mass spectroscopic study , 1994 .
[36] R. Pecora,et al. Rotational Relaxation of Chlorobenzene in Poly(methyl methacrylate). 2. Theoretical Interpretation , 1980 .
[37] M. Kiguchi,et al. Fluorescence characterization of ablated polymeric materials: Poly(methyl methacrylate) doped with 1‐ethylpyrene , 1990 .
[38] R. Pecora,et al. Rontational Relaxation of Chorobenzene in Poly(methyl methacrylate). 1. Temperature and Concentration Effects , 1980 .
[39] Sergey I. Bozhevolnyi,et al. Direct writing in polymethyl methacrylate films using near‐ultraviolet light of Ar+ laser , 1992 .
[40] H. Masuhara,et al. Laser implantation of fluorescent molecules into polymer films , 1996 .
[41] R Linsker,et al. Ultraviolet-laser ablation of skin. , 1985, Archives of dermatology.
[43] H. Masuhara,et al. LASER IMPLANTATION OF PYRENE MOLECULES INTO POLY(METHYL METHACRYLATE) FILMS , 1994 .
[44] Hiroshi Masuhara,et al. The mechanism of dopant-induced laser ablation. Possibility of cyclic multiphotonic absorption in excited states , 1994 .
[45] D. Linde,et al. Velocity distribution of molecular fragments from polymethylmethacrylate irradiated with UV laser pulses , 1986 .
[46] Picosecond coherent Raman study of solid-state chemical reactions during laser polymer ablation , 1994 .
[47] P. Simon,et al. Nanosecond and femtosecond excimer laser ablation of fused silica , 1992 .
[48] G. Blanchet,et al. Thin-film fabrication by laser ablation of addition polymers , 1994 .
[49] Bodil Braren,et al. Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: laser-induced fluorescence analysis, chemical analysis, and doping studies , 1986 .
[50] S. C. Langford,et al. The role of defects in the rear side laser ablation of MgO at 308 nm , 1996 .
[51] S. C. Langford,et al. Interactions of wide band-gap single crystals with 248 nm excimer laser radiation. II: NaCl , 1993 .
[52] H. Hiraoka,et al. Dopant‐induced ablation of polymers by a 308 nm excimer laser , 1988 .
[53] Hiroshi Masuhara,et al. Porphyrin-sensitized laser swelling and ablation of polymer films , 1991 .