Stress analysis of silica-based arrayed waveguide grating by a finite element method
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The stress distribution in silica optical waveguides on silicon is calculated by using finite element method (FEM). The waveguides are mainly subjected to compressive stress along the x direction and the z direction, and it is accumulated near the interfaces between the core and cladding layers. The shift of central wavelegnth of silica arrayed waveguide grating on silicon-substrate with the designed wavelength and the polarization dependence are caused by the stress in the silica waveguides.