Using OPC to optimize for image slope and improve process window
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[1] Yuri Granik,et al. MEEF as a matrix , 2002, SPIE Photomask Technology.
[2] Steffen Schulze,et al. Lithographic comparison of assist feature design strategies , 2002, SPIE Advanced Lithography.
[3] Travis E. Brist,et al. Model-assisted placement of subresolution assist features: experimental results , 2003, SPIE Advanced Lithography.
[4] Yuri Granik,et al. Contrast-based assist feature optimization , 2002, SPIE Advanced Lithography.
[5] Yuri Granik,et al. Model-based OPC using the MEEF matrix , 2002, Photomask Technology.
[6] Yuri Granik,et al. Two-dimensional G-MEEF theory and applications , 2002, Photomask Japan.
[7] Bruce W. Smith,et al. OPC and image optimization using localized frequency analysis , 2002, SPIE Advanced Lithography.
[8] Lars W. Liebmann,et al. Optimizing style options for subresolution assist features , 2001, SPIE Advanced Lithography.