Descriping the Anisotropy of Marked Planner Point Process

This paper presents exploratory methods for describing various aspects of anisotropy for a marked planar point process, First-order methods give basic information by analysing an associated segment process, It can be refined by second-order methods such as the well-known orientation analysis and its variants, Also methods for detecting local anisotropies, which were originally developed for isotropic point processes, can be useful, However, two examples show that formal application of methods for isotropic processes in the case of anisotropy may be dangerous, Since many geometrical structures such as grain (or coverage) processes or segment processes can be described in a natural way as marked point processes, the methods described here can be applied also outside the area of point process statistics.