Impact of bottom electrode and SrxTiyOz film formation on physical and electrical properties of metal-insulator-metal capacitors
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H. Bender | K. Opsomer | B. Govoreanu | L. Altimime | J. Kittl | M. Popovici | J. Swerts | B. Kaczer | V. Afanas’ev | I. Debusschere | A. Belmonte | P. Favia | C. Vrancken | Min-Soo Kim | C. Demeurisse | K. Tomida | W. Wang | M. Pawlak