Investigation for (100)-/(001)-Oriented Pb(Zr,Ti)O3 Films Using Platinum Nanofacets and PbTiO3 Seeding Layer

The (100)-/(001)-oriented Pb(Zr,Ti)O3 films using Pt nanofacets and PbTiO3 seeding layer were invesigated. The Ti/Pt electrodes were deposited using a sputtering system. Pb(Zr,Ti)O3 and PbTiO3 seeding layer were deposited using a semi-homemade metal organic chemical vapor deposition (MOCVD) apparatus. The Pt nanofacets on hillocks caused by Ti diffusion and compressive stress can be prepared by preannealing of the electrode on the substrate. The most highly (100)-/(001)-oriented Pb(Zr,Ti)O3 films were obtained with the same thickness deposition of the PbTiO3 seeding layer as the half value of maximum roughness (Rz) of the Pt surface, which is approximately 3.5–4.0 nm. A simple (100)/(001) orientation method was developed without any special oxide metal electrodes or single-crystal substrates for orientation using commonly unpreferable hillocks, which cause the problems. This simple method is suitable for commercial applications in the future.

[1]  Ryutaro Maeda,et al.  Sensing Property of Self-Sensitive Piezoelectric Microcantilever Utilizing Pb(Zr0.52/Ti0.48)O3 Thin Film and LaNiO3 Oxide Electrode , 2007 .

[2]  K. Uchino,et al.  Crystal orientation dependence of piezoelectric properties of lead zirconate titanate near the morphotropic phase boundary , 1998 .

[3]  Paul Muralt,et al.  Stabilized Platinum Electrodes for Ferroelectric Film Deposition using Ti, Ta and Zr Adhesion Layers , 1998 .

[4]  S. Trolier-McKinstry,et al.  Thin Film Piezoelectrics for MEMS , 2004 .

[5]  M. Kosec,et al.  Effect of Film Thickness on Electrical Properties of Chemical Solution Deposition-Derived Pb(ZrxTi1-x)O3/LaNiO3/Si , 2007 .

[6]  M. Esashi,et al.  Novel Design for Optical Scanner with Piezoelectric Film Deposited by Metal Organic Chemical Vapor Deposition , 2010 .

[7]  K. Saito,et al.  Large remanent polarization of 100% polar-axis-oriented epitaxial tetragonal Pb(Zr0.35Ti0.65)O3 thin films , 2003 .

[8]  Joon-Tae Song,et al.  Characteristics of Pb(Zr,Ti)O3 thin films deposited on Ru/RuO2 double layer , 2004 .

[9]  Duck-Kyun Choi,et al.  Formation of hillocks in Pt/Ti electrodes and their effects on short phenomena of PZT films deposited by reactive sputtering , 2000 .

[10]  A. Kinbara,et al.  Formation of high adhesive and pure Pt layers on TiO2 , 1992 .

[11]  Steven M. Bilodeau,et al.  Liquid‐delivery MOCVD: chemical and process perspectives on ferro‐electric thin film growth , 2000 .

[12]  A. W. Groenland,et al.  Stability of thin platinum films implemented in high-temperature microdevices , 2009 .

[13]  T. Sands,et al.  Ferroelectric La‐Sr‐Co‐O/Pb‐Zr‐Ti‐O/La‐Sr‐Co‐O heterostructures on silicon via template growth , 1993 .

[14]  M. Shimizu,et al.  Control of Orientation of Pb(Zr, Ti)O3 Thin Films Using PbTiO3 Buffer Layer , 1994 .

[15]  Seung Jin Yeom,et al.  Platinum(100) hillock growth in a Pt/Ti electrode stack for ferroelectric random access memory , 2003 .

[16]  S. Yeom,et al.  Platinum (100) Hillock Growth in Pt/Ti Electrode Stack for SrBi2Ta2O9 Ferroelectric Random Access Memory , 2004 .

[17]  Paul Muralt,et al.  Mixed titania-lead oxide seed layers for PZT growth on Pt(111): a study on nucleation, texture and properties , 2004 .

[18]  Takashi Nakamura,et al.  Fabrication Technology of Ferroelectric Memories , 1997 .