论文信息 - Microwave planar antenna with RF‐sputtered indium tin oxide films

Microwave planar antenna with RF‐sputtered indium tin oxide films

A transparency printed antenna realized with indium in oxide films (ITO) is investigated. ITO films are deposited on a glass substrate by reactive RF sputtering. A microstrip antenna is rigorously analyzed and optimized, with a full-wave approach, to operate at 5.8 GHz. The obtained theoretical results are compared to the measured ones, where a satisfactory agreement confirms the validity of the proposed technology for microwave applications. © 2000 John Wiley & Sons, Inc. Microwave Opt Technol Lett 24: 3–7, 2000.

M. Drissi | N. Outaleb | J. Pinel | O. Bonnaud | M. Drissi

[1] A. Gopinath,et al. Variation of microstrip losses with thickness of strip , 1971 .

[2] K. Itoyama. Properties of Sn-Doped Indium Oxide Prepared by High Rate and Low Temperature RF Sputtering , 1978 .

[3] R. Bube,et al. Effects of heat treatment on the optical and electrical properties of indium–tin oxide films , 1978 .

[4] A. Steckl,et al. The effect of ambient atmosphere in the annealing of indium tin oxide films , 1980 .

[5] S. Ray,et al. Properties of tin doped indium oxide thin films prepared by magnetron sputtering , 1983 .

[6] K. Sreenivas,et al. Preparation and characterization of rf sputtered indium tin oxide films , 1985 .

[7] M. Libra,et al. Effect of post-deposition vacuum annealing on properties of ITO layers , 1988 .

[8] U. Mitra,et al. Indium tin oxide thin films for metallization in microelectronic devices , 1989 .

[9] A. Mansingh,et al. Effect of target‐substrate distance on the growth and properties of rf‐sputtered indium tin oxide films , 1989 .

[10] Jacques Citerne,et al. A general treatment of matched terminations using integral equations modeling and applications , 1994 .

[11] P. Thilakan,et al. Reactive thermal deposition of indium oxide and tin-doped indium oxide thin films on inp substrates , 1997 .

[12] S. Honda,et al. Depth profiling of oxygen content of indium tin oxide fabricated by bias sputtering , 1997 .