Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures
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F. Senocq | C. Genevois | C. Vahlas | D. Samélor | B. Caussat | V. Turq | R. Laloo | N. Pellerin | T. Sauvage | K. C. Topka | Babacar Diallo | Daniel Sadowski | H. Vergnes | T. Sauvage | D. Sadowski | N. Pellerin | B. Diallo