论文信息 - Metrology Challenges for Highly Parallel Micro-Manufacture - 字舞流文

Metrology Challenges for Highly Parallel Micro-Manufacture

Richard K. Leach | Adam Krysinski | R. Leach | Christopher W. Jones | B. Sherlock | Ben Sherlock | A. Krysinski

[1] R. Leach. Optical measurement of surface topography , 2011 .

[2] Myung K. Kim. Principles and techniques of digital holographic microscopy , 2010 .

[3] Wolfgang Osten,et al. Scaled topometry in a multisensor approach , 2004 .

[4] Richard G Baraniuk,et al. More Is Less: Signal Processing and the Data Deluge , 2011, Science.

[5] Henning Sirringhaus,et al. High yield, single droplet electrode arrays for nanoscale printed electronics. , 2010, ACS nano.

[6] G. Dai,et al. A metrological large range atomic force microscope with improved performance. , 2009, The Review of scientific instruments.

[7] J. Rodenburg. Ptychography and Related Diffractive Imaging Methods , 2008 .

[8] Kevin G. Harding,et al. Handbook of Optical Dimensional Metrology , 2013 .

[9] Tino Hausotte,et al. New applications of the nanopositioning and nanomeasuring machine by using advanced tactile and non-tactile probes , 2007 .

[10] Jian Wang,et al. Intelligent sampling for the measurement of structured surfaces , 2012 .