Dynamic Modeling of Radiation-Induced State Changes in ${\hbox {HfO}_2}/\hbox {Hf}$ 1T1R RRAM

Single and multiple-event upsets in HfO2/Hf one transistor, one resistor (1T1R) resistive random access memory (RRAM) structures are modeled dynamically using 3-D technology computer-aided design (TCAD) simulations. A dynamic single-event compact model is presented that allows direct correlation of the ion-generated voltage transient across the RRAM and the change in RRAM resistance. Experiments and modeling demonstrate an exponential relationship between the susceptibility of the RRAM and the applied voltage. Two implementations of the model are also presented including hardening voltage-susceptible resistive memory technologies and the impact of highly scaled access transistors.

[1]  K. Kim,et al.  From the future Si technology perspective: Challenges and opportunities , 2010, 2010 International Electron Devices Meeting.

[2]  Frederick T. Chen,et al.  Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).

[3]  Ru Huang,et al.  Total Ionizing Dose (TID) Effects on $\hbox{TaO}_{x}$ -Based Resistance Change Memory , 2011, IEEE Transactions on Electron Devices.

[4]  Shimeng Yu,et al.  Metal–Oxide RRAM , 2012, Proceedings of the IEEE.

[5]  S. M. Dalton,et al.  Initial Assessment of the Effects of Radiation on the Electrical Characteristics of ${\rm TaO}_{\rm x}$ Memristive Memories , 2012, IEEE Transactions on Nuclear Science.

[6]  A. Fantini,et al.  The Impact of X-Ray and Proton Irradiation on ${\rm HfO}_2/{\rm Hf}$-Based Bipolar Resistive Memories , 2013, IEEE Transactions on Nuclear Science.

[7]  A. Fantini,et al.  Single- and Multiple-Event Induced Upsets in ${\rm HfO}_2/{\rm Hf}$ 1T1R RRAM , 2014, IEEE Transactions on Nuclear Science.

[8]  Ru Huang,et al.  Investigation on the Response of TaO $_{\rm x}$-based Resistive Random-Access Memories to Heavy-Ion Irradiation , 2013, IEEE Transactions on Nuclear Science.

[9]  Total-dose response of HfO2/Hf-based bipolar resistive memories , 2013 .

[10]  D. Ielmini Filamentary-switching model in RRAM for time, energy and scaling projections , 2011, 2011 International Electron Devices Meeting.

[11]  Mark Y. Liu,et al.  Technology options for 22nm and beyond , 2010, 2010 International Workshop on Junction Technology Extended Abstracts.

[12]  Frederick T. Chen,et al.  Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfO2 based RRAM , 2008, 2008 IEEE International Electron Devices Meeting.

[13]  P. Oldiges,et al.  Channel doping impact on FinFETs for 22nm and beyond , 2012, 2012 Symposium on VLSI Technology (VLSIT).

[14]  M. Tsai,et al.  Robust High-Resistance State and Improved Endurance of $\hbox{HfO}_{X}$ Resistive Memory by Suppression of Current Overshoot , 2011, IEEE Electron Device Letters.

[15]  R. Degraeve,et al.  Postcycling LRS Retention Analysis in HfO2/Hf RRAM 1T1R Device , 2013, IEEE Electron Device Letters.

[16]  Mark Y. Liu,et al.  Technology Options for 22 nm and Beyond , 2010 .

[17]  O. Faynot,et al.  Transient Radiation Response of Single- and Multiple-Gate FD SOI Transistors , 2007, IEEE Transactions on Nuclear Science.