PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)
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Geert Vandenberghe | Hans-Jürgen Stock | Peter De Bisschop | Kazuhiro Takeshita | Yuichi Yoshida | Danilo De Simone | John S. Petersen | Philippe Foubert | Seiji Nagahara | Kathleen Nafus | Serge Biesemans | Cong Que Dinh | Gosuke Shiraishi | Yuya Kamei | Yoshihiro Kondo | Michael Carcasi | Yukie Minekawa | Hiroyuki Ide | Kosuke Yoshihara | Ryo Shimada | Masaru Tomono | Hideo Nakashima | Balint Meliorisz | H. Stock | G. Vandenberghe | K. Nafus | S. Biesemans | S. Nagahara | Y. Minekawa | Y. Kamei | M. Carcasi | Hiroyuki Ide | Y. Kondo | Yuichi Yoshida | Kosuke Yoshihara | Ryo Shimada | M. Tomono | K. Takeshita | J. Petersen | D. de Simone | P. Foubert | P. de Bisschop | B. Meliorisz | Gosuke Shiraishi | C. Dinh | H. Nakashima
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