Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers
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Kai Chen | Tadaaki Nagao | Thang Duy Dao | Toshihide Nabatame | Satoshi Ishii | Akihiko Ohi | Masahiro Kitajima | T. Nagao | T. Nabatame | A. Ohi | M. Kitajima | Kai Chen | T. D. Dao | S. Ishii
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