Prognostic methodology for deep submicron semiconductor failure modes
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Semiconductor reliability issues are beginning to emerge as a major impediment to long term reliability of critical systems such as Internet routers, ATM machines, and Automotive/Aerospace fly-by-wire systems. Semiconductors have certain defined failure modes that can contribute to end-of life failures. These modes include time-dependent dielectric breakdown of the gate oxide (TDDB), hot carrier damage, and metal migration. All of these common failure modes are far worse at geometries below 0.25 /spl mu/m. Fortunately, there are methods proposed that counteract these common failure modes. This paper surveys the problems involved, and recommends a methodology for the inclusion of pre-calibrated prognostic cells that can be co-located with a host circuit to provide an "early-warning" of a system failure, so that appropriate corrective action can be taken.
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