High‐temperature stable W/GaAs interface and application to metal–semiconductor field‐effect transistors and digital circuits

The thermal stability of the physical, chemical, and electrical properties of W thin films sputter deposited on GaAs were investigated. A variety of characterization methods, including thin film stress analysis, Auger analysis, Rutherford backscattering spectrometry (RBS) analysis, and Schottky barrier measurements showed that the W/GaAs interface remains stable after high‐temperature furnace annealing at 900 °C for 15 min or rapid‐lamp annealing at 1000 °C for 11 s. Some refractory metal compounds were also investigated, including, WSi, WNx, and TaSix. Pure W films produced the best Schottky diode characteristics. The average Schottky barrier height was 0.70±0.009 V across a 2‐in wafer after furnace annealing at 800 °C/15 min. Pure W self‐aligned gate (SAG) metal‐semiconductor field‐effect transistors (MESFET) and digital circuits were also fabricated. Transconductances as high as 300 mS/mm (Lg =1.0 μm) were measured for enhancement mode SAG MESFET’s. Circuits were fabricated with SAG MESFET enhancement‐...