Heating of x-ray masks during e-beam writing

In this work we characterized the temperature increase in SiHN mask membrane during e-beam writing. We observed an exponential decay with a decay length in the order of 1mm-1, and absolute temperature raises of 8 degrees K. This is the first time that direct measurement have been obtained. By fitting the observed data, we have extracted the thermal conductivity and emissivity of the film. These experimental values are essential in the modeling of the response of the masks.