First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2 Thin Films with Di(sec-butylamino)silane and Ozone
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Hansong Cheng | R. Pearlstein | B. Han | B. Han | A. Derecskei-Kovacs | H. Chandra | Manchao Xiao | X. Lei | M. O'neill | Liang Huang