Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance

Resonant tunneling diode (RTD) is an electronic device embodying a unique quantum-interference phenomenon: negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures.

[1]  M. Razeghi,et al.  Demonstration of negative differential resistance in GaN/AlN resonant tunneling diodes at room temperature , 2010 .

[2]  Ali Soltani,et al.  Investigation of the negative differential resistance reproducibility in AlN/GaN double-barrier resonant tunnelling diodes , 2011 .

[3]  C. Bayram,et al.  Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN , 2009 .

[4]  L. Esaki,et al.  Resonant tunneling in semiconductor double barriers , 1974 .

[5]  M. Razeghi,et al.  Room temperature negative differential resistance characteristics of polar III-nitride resonant tunneling diodes , 2010 .

[6]  Lin-An Yang,et al.  Quantitative analysis of the trapping effect on terahertz AlGaN/GaN resonant tunneling diode , 2011 .

[7]  M. Razeghi,et al.  AlN/GaN double-barrier resonant tunneling diodes grown by metal-organic chemical vapor deposition , 2010 .

[8]  Martin Eickhoff,et al.  Vertical transport in group III‐nitride heterostructures and application in AlN/GaN resonant tunneling diodes , 2004 .

[9]  B. Krauskopf,et al.  Proc of SPIE , 2003 .

[10]  C. T. Foxon,et al.  Current-voltage characteristics of zinc-blende (cubic) Al0.3Ga0.7N/GaN double barrier resonant tunneling diodes , 2010 .

[11]  D. Ferry,et al.  Transport in nanostructures , 1999 .

[12]  A. E. Belyaev,et al.  Current–voltage instabilities in GaN/AlGaN resonant tunnelling structures , 2003 .

[13]  L. Esaki New Phenomenon in Narrow Germanium p-n Junctions , 1958 .

[14]  S. Denbaars,et al.  Formation and reduction of pyramidal hillocks on m-plane {11¯00} GaN , 2007 .

[15]  M. Razeghi,et al.  Reliability in room-temperature negative differential resistance characteristics of low-aluminum content AlGaN/GaN double-barrier resonant tunneling diodes , 2010 .

[16]  Safumi Suzuki,et al.  Fundamental oscillation of resonant tunneling diodes above 1 THz at room temperature , 2010 .

[17]  Werner Schrenk,et al.  Negative differential resistance in dislocation-free GaN/AlGaN double-barrier diodes grown on bulk GaN , 2006 .

[18]  Gottfried Strasser,et al.  Bi‐stable behaviour in GaN‐based resonant tunnelling diode structures , 2008 .

[19]  W. Frensley,et al.  Transient response of a tunneling device obtained from the Wigner function. , 1986, Physical review letters.

[20]  Manijeh Razeghi,et al.  Geiger-mode operation of ultraviolet avalanche photodiodes grown on sapphire and free-standing GaN substrates , 2010 .

[21]  F. Capasso Band-Gap Engineering: From Physics and Materials to New Semiconductor Devices , 1987, Science.

[22]  F. Julien,et al.  Origin of the electrical instabilities in GaN/AlGaN double-barrier structure , 2011 .

[23]  M. Razeghi,et al.  Photoluminescence characteristics of polar and nonpolar AlGaN/GaN superlattices , 2010 .

[24]  Paul Harrison,et al.  Simulation and design of GaN/AlGaN far-infrared (λ∼34 μm) quantum-cascade laser , 2004 .

[25]  N. Klein,et al.  Mechanisms of current formation in resonant tunneling AlN∕GaN heterostructures , 2007 .

[26]  T. Sollner,et al.  Resonant tunneling through quantum wells at frequencies up to 2.5 THz , 1983 .

[27]  Hadis Morkoç,et al.  Valence-band discontinuity between GaN and AlN measured by x-ray photoemission spectroscopy , 1994 .

[28]  M Razeghi,et al.  III-Nitride Optoelectronic Devices: From Ultraviolet Toward Terahertz , 2011, IEEE Photonics Journal.

[29]  Manijeh Razeghi Toward realizing high power semiconductor terahertz laser sources at room temperature , 2011, Defense + Commercial Sensing.

[30]  Masayoshi Tonouchi,et al.  Cutting-edge terahertz technology , 2007 .

[31]  Michael S. Shur,et al.  Elastic strain relaxation and piezoeffect in GaN-AlN, GaN-AlGaN and GaN-InGaN superlattices , 1997 .

[32]  M. Razeghi,et al.  GaN avalanche photodiodes grown on m-plane freestanding GaN substrate , 2010 .

[33]  Quantum transport in GaN/AlN double-barrier heterostructure nanowires. , 2010, Nano letters.

[34]  S. Fanget,et al.  Growth and optical properties of GaN/AlN quantum wells , 2003, cond-mat/0304124.

[35]  Jen-Inn Chyi,et al.  AlN/GaN double-barrier resonant tunneling diodes grown by rf-plasma-assisted molecular-beam epitaxy , 2002 .

[36]  T. Mayer,et al.  Room temperature negative differential resistance in molecular nanowires , 2002 .

[37]  Hysteresis of tunnel current in w-GaN/AlGaN(0001) double-barrier structures , 2008 .