Metal–insulator transitions in (V1-xCrx)2O3 thin films deposited by reactive direct current magnetron co-sputtering
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M. Besland | L. Cario | B. Corraze | E. Janod | S. Députier | M. Guilloux-Viry | S. Cordier | V. Bouquet | J. Tranchant | M. Querré