Self-Assembled Nanodot Fabrication by Using PS-PDMS Block Copolymer

The downsizing of nanolithography technology has given great benefit on achieving faster, low power consumption, and high integrated structure of electronics devices. Therefore, this nanolithography technology has drawn many scientists and engineers to be involved and put their main goal on this field in many decades. To obtain nanostructures especially nanodot, there are many methods which have been developed. Before block copolymer self-assembly technique is presented, those methods to fabricate nanostructures are discussed. Those methods could be divided into 2 large categories. Those are top-down method and bottom-up methods. The methods to fabricate nanodot also could be divided into top-down and bottom-up methods. Top-down method patterns material at large scale by reducing its dimension to the nanoscale. Bottom-up methods arrange atoms or molecules to form nanostructures.