High-Frequency Noise of Modern MOSFETs: Compact Modeling and Measurement Issues

Compact modeling of the most important high-frequency (HF) noise sources of the MOSFET is presented in this paper, along with challenges in noise measurement and deembedding of future CMOS technologies. Several channel thermal noise models are reviewed and their ability to predict the channel noise of extremely small devices is discussed. The impact of technology scaling on noise performance of MOSFETs is also investigated by means of analytical expressions. It is shown that the gate tunneling current has a significant impact on MOSFETs noise parameters, especially at lower frequencies. Limitations of some commonly used noise models in predicting the HF noise parameters of modern MOSFETs are addressed and methods to alleviate some of the limitations are discussed

[1]  Wolfgang Fichtner,et al.  Simulation of RF Noise in MOSFETs Using Different Transport Models , 2003 .

[2]  Yuhua Cheng,et al.  High frequency characterization of gate resistance in RF MOSFETs , 2001, IEEE Electron Device Letters.

[3]  M.J. Deen,et al.  MOSFET modeling for RF IC design , 2005, IEEE Transactions on Electron Devices.

[4]  M. J. Deen,et al.  A general noise and S-parameter deembedding procedure for on-wafer high-frequency noise measurements of MOSFETs , 2001 .

[5]  A. Birbas,et al.  Thermal noise modeling for short-channel MOSFETs , 1996 .

[6]  Chih-Hung Chen,et al.  Modeling the partition of noise from the gate-tunneling current in MOSFETs , 2005, IEEE Electron Device Letters.

[7]  M. J. Deen,et al.  Channel noise modeling of deep submicron MOSFETs , 2002 .

[8]  M. Sannino,et al.  On the determination of device noise and gain parameters , 1979, Proceedings of the IEEE.

[9]  Horng-Chih Lin,et al.  A novel self-aligned T-shaped gate process for deep submicron Si MOSFET's fabrication , 1998, IEEE Electron Device Letters.

[10]  Juan C. Ranuarez Broadband Microwave Amplifiers in Deep Sub-micron CMOS Technology , 2005 .

[11]  G. Gonzalez Microwave Transistor Amplifiers: Analysis and Design , 1984 .

[12]  H. Zirath,et al.  The influence of the gate leakage current and the gate resistance on the noise and gain performances of 90-nm CMOS for micro- and millimeter-wave frequencies , 2004, 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535).

[13]  Y. Ono,et al.  Fabrication and characterization of sub-quarter-micron MOSFETs with a copper gate electrode , 1999, IEEE Electron Device Letters.

[14]  A. Hoffmann,et al.  Overview of the impact of downscaling technology on 1/f noise in p-MOSFETs to 90 nm , 2004 .

[15]  M.J. Deen,et al.  An effective gate resistance model for CMOS RF and noise modeling , 1998, International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).

[16]  G. Knoblinger,et al.  A new model for thermal channel noise of deep submicron MOSFETs and its application in RF-CMOS design , 2000, 2000 Symposium on VLSI Circuits. Digest of Technical Papers (Cat. No.00CH37103).

[17]  T. P. Chen A simple technique to determine barrier height change in gate oxide caused by electrical stress , 2002 .

[18]  P. Klein,et al.  An analytical thermal noise model of deep submicron MOSFET's , 1999, IEEE Electron Device Letters.

[19]  R. Q. Lane,et al.  The determination of device noise parameters , 1969 .

[20]  G. Gildenblat,et al.  Quasi-static and nonquasi-static compact MOSFET models based on symmetric linearization of the bulk and inversion charges , 2003 .

[21]  Gijs Bosman,et al.  Noise model of gate-leakage current in ultrathin oxide MOSFETs , 2003 .

[22]  D.B.M. Klaassen,et al.  Accurate thermal noise model for deep-submicron CMOS , 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).

[23]  Young June Park,et al.  Modeling of thermal noise in short-channel MOSFETs at saturation , 2000 .

[24]  G. Gildenblat,et al.  Symmetric bulk charge linearisation in charge-sheet MOSFET model , 2001 .

[25]  F. Danneville,et al.  Influence of a Tunneling Gate Current on the noise performance of SOI MOSFETs , 2004, 2004 IEEE International SOI Conference (IEEE Cat. No.04CH37573).

[26]  Gijs Bosman,et al.  Comprehensive noise performance of ultrathin oxide MOSFETs at low frequencies , 2004 .

[27]  M. J. Deen,et al.  Modelling of bonding pads and their effect on the high-frequency-noise figure of polysilicon emitter bipolar junction transistors , 1996 .

[28]  M.J. Deen,et al.  Analytical modeling of MOSFETs channel noise and noise parameters , 2004, IEEE Transactions on Electron Devices.

[29]  C. Fiegna Analysis of gate shot noise in MOSFETs with ultrathin gate oxides , 2003, IEEE Electron Device Letters.

[30]  Keith Jones,et al.  LRM and LRRM Calibrations with Automatic Determination of Load Inductance , 1990, 36th ARFTG Conference Digest.

[31]  M. Shoji,et al.  Analysis of high-frequency thermal noise of enhancement mode MOS field-effect transistors , 1966 .

[32]  R. Havens,et al.  Noise modeling for RF CMOS circuit simulation , 2003 .

[33]  M. J. Deen,et al.  High frequency noise of MOSFETs I Modeling , 1998 .

[34]  Alexios Birbas,et al.  Induced gate noise in MOSFETs revisited: The submicron case , 1997 .

[35]  Bing J. Sheu,et al.  BSIM: Berkeley short-channel IGFET model for MOS transistors , 1987 .

[36]  C. Hu,et al.  Hole injection SiO/sub 2/ breakdown model for very low voltage lifetime extrapolation , 1994 .

[37]  A. G. Jordan,et al.  Theory of noise in metal oxide semiconductor devices , 1965 .

[38]  Peter Russer,et al.  An efficient method for computer aided noise analysis of linear amplifier networks , 1976 .

[39]  Y. Tsividis Operation and modeling of the MOS transistor , 1987 .

[40]  A. Ziel Noise in solid state devices and circuits , 1986 .

[41]  M. Mitama,et al.  An Improved Computational Method for Noise Parameter Measurement , 1979 .

[42]  Chih-Hung Chen,et al.  A review of gate tunneling current in MOS devices , 2006, Microelectron. Reliab..

[43]  C. C. McAndrew,et al.  An improved MOSFET model for circuit simulation , 1998 .

[44]  Guo-Wei Huang,et al.  Comments on "A shield-based three-port de-embedding method for microwave on-wafer characterization of deep-submicrometer silicon MOSFETs" , 2005 .

[45]  A. Ziel Gate noise in field effect transistors at moderately high frequencies , 1963 .

[46]  F. M. Klaassen,et al.  Thermal noise of MOS transistors , 1967 .

[47]  Kwangseok Han,et al.  Analytical drain thermal noise current model valid for deep submicron MOSFETs , 2004 .

[48]  A.S. Roy,et al.  Noise modeling methodologies in the presence of mobility degradation and their equivalence , 2006, IEEE Transactions on Electron Devices.

[49]  A. Litwin,et al.  Overlooked interfacial silicide-polysilicon gate resistance in MOS transistors , 2001 .

[50]  R. Gharpurey,et al.  RF MOSFET modeling accounting for distributed substrate and channel resistances with emphasis on the BSIM3v3 SPICE model , 1997, International Electron Devices Meeting. IEDM Technical Digest.

[51]  Shoji Otaka,et al.  RF noise in 1.5 nm gate oxide MOSFETs and the evaluation of the NMOS LNA circuit integrated on a chip , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

[52]  M. Deen,et al.  Extraction of the induced gate noise, channel noise, and their correlation in submicron MOSFETs from RF noise measurements , 2001 .

[53]  R. Jindal Hot-electron effects on channel thermal noise in fine-line NMOS field-effect transistors , 1986, IEEE Transactions on Electron Devices.